CONSIDERATIONS REGARDING THE USE OF SU-8 PHOTORESIST IN MEMS TECHNIQUE
Keywords:
Photolithography, photoresist, SU-8, micro-electro-mechanical systems (MEMS), microfluidicsAbstract
Microelectromechanical systems (MEMS) represent the technology of microscopic devices. In this domain, photolithography is the most common method in order to obtain MEMS structures. The photoresist is the key element for microelectronic and MEMS technology. SU-8 is one kind of negative photoresist, used basically for microfluidics. This paper presents experiments of SU-8 etching in O2/SF6 and Ar/SF6 plasma. Monocrystalline silicon wafers with 3" diameter were used, which had native oxide preserved. The SU-8 was spin-coated on the wafers with a thickness of approximately 100 μm. The experiments were made with varying the gas flow rate and the pressure in the reactor. The etching depth and the underetching gave different values every time.
References
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2. Specialized Materials Meet Critical Packaging Needs in MEMS Devices, Master Bond Tech Spotlight, white paper, (2008).
3. Oltean, I.D., Tehnologie Electronica, Tehnologia Dispozitivelor Semiconductoare si a Circuitelor Integrat, Ed. Matrixrom, Bucuresti, (2004).
4. Vania C. Pinto, Paulo J. Sousa, Vanessa F. Cardoso, Graca Minas; Optimized SU-8 processing for Low-Cost Microstructures Fabrication without Cleanroom Facilities, Micromachines, (2014).
5. Sushanta K. Mitra, Suman Chakraborty, Microfluidics and Nanofluidics Handbook, Chapter: SU-8 Photolithography and Its Impact on Microfluidics pp 231-268, CRC Press, (2011).
6. Claudia Garcia, Anna Schomacker, Ingo Klarholz, Carsten Harms, Walter Lang, Fabrication of Microfluidic Devices using SU-8 for Detection and Analysis of Viruses, SENSOR+TEST Conference (2009) - SENSOR Proceedings I.
7. Zhiyi Zhang, Ping Zhao, Gaozhi Xiao, BenjaminR. Watts, Changqing Xu., Saeling SU-8 microfluidic channels using PDMS, Biomicrofluidics 5, 046503(2011).
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Published
2018-09-28
How to Cite
Marinescu, M. R., Avram, M., Parvulescu, C., Voitincu, C., Tucureanu, V., & Matei, A. (2018). CONSIDERATIONS REGARDING THE USE OF SU-8 PHOTORESIST IN MEMS TECHNIQUE. Nonconventional Technologies Review, 22(3). Retrieved from https://revtn.ro/index.php/revtn/article/view/34
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