TECHNOLOGICAL ASPECTS REGARDING THE USE OF PHOTOLITOGRAPHY IN OBTAINING MICRO-ELECTRO-MECHANICAL SYSTEMS (MEMS)

Abstract

Micro-electro-mechanical systems (MEMS) include a vast area corresponding to the technological development in the last decades. MEMS are included in a multitude of areas, almost in everything that surrounds us. This aids of small dimensions and high tech are increasingly present in our daily life. The paper presents one of the most popular ways to obtain such a system, wich is the photolithography. The block diagram of the photolithography process is presented and further, the main lithographycal operations are defined and described as they are achieved at IMT Bucharest. Both the used equipment and the main technological guidance specific to each stage are highlighted.